Abstract
By simultaneously measuring the phonon scattering at or near a silicon surface and the phonon transmission from it into liquid helium, we have correlated quantitatively these two processes. For a clean polished silicon surface, the scattering of thermal phonons below 0.3 K becomes very small, and the transmission probability in this case approaches the prediction of the acoustic mismatch theory, which is 0.27%. The transmission probability increases, i.e. the thermal boundary resistance decreases, as the diffuse scattering increases either as a result of increasing the phonon frequency or the disorder at the surface. In the limit of completely diffuse scattering, the phonon transmission probability exceeds 30%, and the thermal boundary resistance approaches the value predicted by the diffuse mismatch model to within a factor of three.
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