Abstract
The effects of exposure of molecular nitrogen and oxygen on p-type InP(100) surfaces modified by potassium overlayers were studied by core level and valence band (VB) photoemission using synchrotron radiation. On the K pre-covered surface, the potassium coverage enhanced the nitrogen and oxygen sticking coefficients dramatically. As far as the process of nitrogen adsorption is concerned, nitrogen atoms react mainly with P atoms rather than not react directly with indium atoms. Two kinds of nitride complexes, InPXx and InPNx + y were formed at the K-precovered InP(100) surface. In case of oxygen adsorption, O may bond with K and produce the peroxides O22− and superoxides O2−. Following this a few kinds of phosphate phases, In(PO4)x, were formed on the surface. In comparison with InP(110) surface, we found that the oxidation and nitridation promotion for the InP(100) surface was much stronger. The reasons may be the number of surface defects as well as the polarity of the InP(100) surface.
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