Abstract

A new, nondestructive junction depth measurement technique for HgCdTe photovoltaic devices is investigated. The technique uses a scanning laser microscope to obtain laser beam induced current (LBIC) data from which information regarding the junction depth is extracted, and is applicable to both homojunction and heterojunction diodes. For implanted heterojunction photodiodes, the position of the n-p junction relative to the heterojunction is an important factor determining completed device performance, with blind photodiodes resulting if the n-p junction is incorrectly placed. At present, the only methods available for junction depth determination (e.g., secondary ion mass spectroscopy and differential Hall) are destructive and not applicable as routine process monitoring techniques. It is envisaged that the development of a nondestructive routine process monitoring procedure will help improve yield and reduce the cost of HgCdTe photovoltaic devices. In this paper, experimental and theoretical results are presented in order to assess the sensitivity of the new technique to the effects of junction doping density, illumination wavelength, frontside/backside illumination, and test structure geometry.

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