Abstract
The main aim of this work is to evaluate magnetostriction performances, including Joule magnetostriction and volume magnetostriction, of FeGa thin films synthesized by electrodeposition and ion-beam sputtering. This research demonstrated that the electrodeposited Fe(100-x)Gax (x: 19 ∼ 26) films had a tensile stress, and the ion-beam sputtered Fe81Ga19 film had a compressive stress. In both films, the easy axis of magnetization was in the in-plane direction. Both films exhibited nearly (110)-oriented polycrystalline structures. For the ion-beam sputtered Fe81Ga19 film, the observed volume magnetostriction was 39 ppm, approximately one-third of the Joule magnetostriction of 116 ppm. For electrodeposited Fe81Ga19, the Joule and volume magnetostrictions were 64 ppm and 46 ppm, respectively. An important conclusion of this research was that the FeGa films formed by non-equilibrium growth processes displayed a large volume magnetostriction.
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