J2240101 3Dレーザーリソグラフィを用いた繊維状基材用フォトマスクの開発([J224-01]『マイクロ・ナノ機械の信頼性』のための材料創製・測定・解析技術 ナノ構造加工・プロセス)

Abstract

In this paper, we present a new technology for forming half-pipe masks with fine patterns in order to prepare micro devices on fiber-like substrates directly. Half-pipe substrates are successfully fabricated by using tiny quartz capillaries with the outer diameter of 1.8 mm and inner diameter of 320 μm. The thin photoresist film is deposited on the half-pipe substrates, and micro patterns are prepared directly by using 3D laser lithography, which is based on two-photon polymerization. Thin Cr film is prepared on the patterned resist film and then patterned by using lift-off process. The minimum feature of the mask patterns is 5 μm wide and 1000 μm long. Therefore, half-pipe masks are successfully prepared for three dimensional (3D) photolithography process on fiber-like substrates. Mass production of micro devices on the fiber-like substrates could be expected by using the prepared half-pipe masks.