Abstract
In Micro Electro Mechanical Systems (MEMS) technology, structure of amorphous alloy thin film is manufactured by sputter deposition and lift-off process. But its thickness is not uniform because lift-off masking material block off. The structure thickness of amorphous alloy thin film is low in the vicinity of lift-off masking material, and its cross-sectional shape is not rectangular. For these problems, we proposed new fabrication method of thick film structure of metallic glass with the sputtering jig, which combines projection surfaces and spacers. As this application, we have successfully fabricated two-axis scanning micro mirror device with thin film metallic glass Cu-Zr-Ti, which have uniform film thickness, rectangular cross-sectional shape and electrical factors. However, the sample was not able to be driven in driving test, because the torsion bar of sample had been broken for Cu-Zr-Ti crystallization. In this paper, we proposed low temperature production process which is not to crystallize Cu-Zr-Ti. And we have succeeded in fabricating and driving the two-axis scanning micro mirror device.
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