Abstract
The SiO2 generated by low-temperature oxidation of ultra-thin metallic silicon (thickness = 50 nm) film was evaluated for implementation in one-glass-solution capacitive touch-screen panels (OGS-TSPs) on sapphire-based substrates. Our results show that the silicon films oxidized at 823 K exhibited the highest visible transmittance about 91% at 550 nm, compared to ~72% transmittance of the as-deposited silicon films which were deposited at room temperature. Additionally, the annealed films exhibited a more uniform, dense, and smooth surface microstructure than that of the as-deposited Si films. X-ray photoelectron spectroscopy (XPS) results revealed that the low-temperature oxidation of Si films at 823 K yielded SiO2. Furthermore, when the insulating SiO2 film obtained by low-temperature oxidation was sandwiched between two indium tin oxide (ITO) layers (ITO/SiO2/ITO) on a sapphire substrate, the SiO2 film resulted in the dielectric strength of approximately 3 MV/cm. In addition, the highest optical transmittance obtained by the ITO/SiO2/ITO films is about 88.3%. The change in capacitance of the ITO/SiO2/ITO structure was approximately 3.2 pF, which indicates the possibility of implementation in capacitive touch-screen panel devices.
Highlights
The high demand for touch-screen panels (TSPs) for implementation in various mobile communication and information devices such as cellular phones, navigation systems, and flat-panel devices continues to increase
We report on low-temperature oxidation of Si film and investigation of its structure and microstructural evolution, and the fabrication of indium tin oxide (ITO)/SiO2 /ITO thin-film structure on a sapphire substrate and discuss its potential implementation in one-glass-solution capacitive touch-screen panels (OGS-TSPs)
The silicon thin films were deposited by radio-frequency (RF) magnetron sputtering on sapphire and ITO/sapphire substrates by using a high-purity (99.999%) silicon target of 2 in. diameter, the sputtering power was fixed at 150 W
Summary
The high demand for touch-screen panels (TSPs) for implementation in various mobile communication and information devices such as cellular phones, navigation systems, and flat-panel devices continues to increase. Various techniques that employ resistive, capacitive or infrared sensors are implemented in TSP designs. Among these techniques, the capacitive touch-sensitive method is most widely used. The capacitive touch-sensitive method is most widely used In this method, the touch activity is identified by detecting minor changes in the electrical charge generated via human contact with a finger or object. TSPs enable multi-touch function and multi-tasking, they have become a replacement for conventional. Coatings 2020, 10, 134 resistive-type TSPs. Sapphire-based display technology is currently garnering a considerable amount of attention as a means to enhance high-end smartphone devices. The advantages of a sapphire-based display over the conventional glass-based display are good scratch resistance and sensitivity [1]
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