Abstract
This work demonstrates the possibility of growing Type-II InAs/GaSb superlattices by MOCVD. The Type-II InAs/GaSb superlattices consisting of 20 pairs of alternating InAs and GaSb layers of equal thickness (1 nm / 2 nm) were grown at a temperature of 500°C. The obtained structures were studied by transmission electron microscopy and electroluminescence. The electroluminescence spectra demonstrated a maximum at about 0.25 eV.
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