Abstract
Amorphous nitrogenated carbon films (a-C:H:N) were deposited by rf magnetron sputtering of a graphite target in an Ar/CH 4/N 2 plasma. The films were characterized by infrared spectroscopy. An increase in the intensity of absorption maximum at 3300–3400 and 1620 cm −1 of the IR spectra was observed. For high nitrogen concentrations, a new maximum appears at 2150 cm −1 indicating that the C and N atoms are chemically bonded in the film. The analysis of the broad absorption band observed between 1700 and 1000 cm −1 was made. Deconvolution of this band showed a six band system, indicating a lack of aromatic structures. The content of nitrogen and sp 2 bonded carbon in the films was seen to increase with a growth of the N 2 partial pressure in the deposition gas.
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