Abstract
We report an ionized-cluster-beam (ICB) deposition and the electrical bistability of C60–tetracyanoquinodimethane (TCNQ) thin films. The films are fabricated by using an ionized-cluster-beam deposition method in a high vacuum system. The as-deposited films were characterized by transmission electron microscopy and optical absorption spectroscopy, which verified the formation of the charge-transfer complex system in C60–TCNQ thin films and the microstructure of these thin films. The structure and the electrical property of the ICB deposited Ag-TCNQ thin films are also presented. The possible conductive mechanism of these ICB deposited thin films is discussed in the letter.
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