Ionized Physical Vapour Deposition combined with PECVD, for synthesis of carbon–metal nanocomposite thin films

Abstract

Carbon–metal composite thin films were synthesized by a hybrid process combining magnetron sputtering and PECVD in an argon–methane plasma. Titanium was chosen as the target metal. The paper is focused on the impact of three types of deposition process (DC magnetron, RF magnetron or Ionized Physical Vapour Deposition – IPVD) on thin films' deposition and microstructure. The effect of the methane fraction in gas discharge was also studied. Films were analysed by EDX, XPS and XRD. Results indicate steady deposition conditions for RF or IPVD operation whatever the methane fraction in the discharge without any problem of discharge instability commonly observed in DC operation. The presence of TiC crystallites in a-C:H matrix was detected at intermediary methane fraction in discharge whatever the operating mode. Nevertheless, at constant methane fraction in discharge, strong difference between film microstructure and composition was observed according to the operating mode.