Abstract

Ion-gated transistors (IGTs) are attractive for chemo- and bio-sensing, wearable electronics, and bioelectronics, because of their ability to act as ion/electron converters and their low operating voltages (e.g., below 1 V). Metal oxides are of special interest as transistor channel materials in IGTs due to their high mobility, chemical stability, and the ease of processing in air at relatively low temperatures (<350 °C). Titanium dioxide is an abundant material that can be used as a channel material in n-type IGTs. In this work, we investigate the role of the morphology of the TiO2 channel (porous vs compact films) and the size of the cations in the gating media ([EMIM][TFSI] and [Li][TFSI] dissolved in [EMIM][TFSI]) to study their role on the electrical characteristics of IGTs. We found that both the film morphology and the type of gating medium highly affect the electrical response of the devices.

Highlights

  • Ion-gated transistors based on porous and compact TiO2 films: Effect of Li ions in the gating medium

  • Metal oxide semiconductors are exploited in a variety of applications, such as sensing, energy conversion and storage, and display technologies

  • Besides pure electrostatic or electrochemical doping, different mechanisms have been considered to describe the operation of ion-gated transistors (IGTs), such as interface-confined electrochemical doping

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Summary

Introduction

Ion-gated transistors based on porous and compact TiO2 films: Effect of Li ions in the gating medium.

Results
Conclusion
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