Abstract
AbstractThe ion beam-induced crystalline-to-amorphous transition was studied for crystalline phases in the MgO-A12O3-SiO 2 system. Samples were irradiated with 1.5 MeV Xe+ at temperatures from 15 to 1023 K, and the dose required for amorphization was determined by in situ transmission electron microscopy. Based on a cascade quenching model, we propose that irradiation-induced amorphization is closely related to glass formation. The rate of crystallization from a melt is the controlling factor in determining the susceptibility to amorphization and glass formation. From the analysis of cascade quenching evolution, we have derived a simple relation between amorphization dose and temperature. A quantitative parameter, S0, that describes the susceptibility to amorphization is derived that considers the crystalline structure, field strength, and phase transition temperature.
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