Abstract
A mechanism of surface plasmon excitation occurring in any, including resonant, processes of neutralization of positive and negative ions near metal surface is proposed and a model of this mechanism is developed. High efficiency of the mechanism and adequacy of the model to the ion-induced photon emission data are demonstrated. The main formulas of the model are discussed in terms of the quantum-mechanical perturbation theory and dielectric formalism.
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Schedule a callMore From: Bulletin of the Russian Academy of Sciences: Physics
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