Abstract
The total electron emission yield γ of sputter-cleaned Al, Cu, Ag, W, and Au surfaces has been measured under bombardment with H +, H 2 +, H 3 +, He +, Ne +, and Ar + ions in the energy range from 80 keV to 1 MeV. The yield γ is found to be proportional to the electronic stopping power in the case of proton impact. Deviations from a strict proportionality are reported for the heavier ions. The yields induced by the molecular ions H 2 + and H 3 + are compared with the proton yields. It is found that the additional electron(s) of the molecular ions directly contribute to the secondary electron yield at the highest velocities of this experiment.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.