Ion-Implanted GaN/AlGaN/GaN HEMTs with Extremely Low Gate Leakage Current

Abstract

ABSTRACTWe demonstrate the realization of compatibility of extremely low gate leakage current and low source resistance with Si ion-implanted (I/I) GaN/AlGaN/GaN surface-stabilized high-electron mobility transistor (HEMT) without any recess etching process. The source/drain regions were formed using Si ion implantation into undoped GaN/AlGaN/GaN on sapphire substrate. Using ion implantation into source/drain (S/D) regions with energy of 80 keV, the performances were significantly improved. On-resistance (Ron) reduced from 105 to 9.2 Ω·mm. Saturation drain current (Idss) and maximum transconductance (gmMAX) increased from 49 to 527 mA/mm and from 13 to 84 mS/mm (Vg=+1V).