Abstract
We show that high-dose ion implantation can be used to introduce rare-earth dopants for the control of precessional dynamics in magnetic thin films. Tb and Gd ions have been implanted in Ni81Fe19 through Ta masks at dosages from 1×1014∕cm2 to 1×1015∕cm2. Effects on dynamics are found to be similar to those contributed by cosputtered Tb and Gd dopants in Ni81Fe19 (50nm). Broadband ferromagnetic resonance measurements from 0to18GHz show that adjustments in damping α from 0.008 to 0.040 are fully intrinsic (Gilbert type) and roughly proportional to dose. The technique enables the creation of films with spatially modulated precessional characteristics.
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