Abstract
Ion Implantation processes contribute significantly to the development of power devices. In this case not smallest scale technologies are addressed, but accurate treatment of the frontside, backside and bulk material play a crucial role to guarantee for key parameters such as highest power densities and required switching behavior. Some representative examples of the development needs of high, medium and low power switching devices based on silicon technology are described and challenges for ion implantation processing are concluded.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
