Abstract
AbstractX‐ray fluorescence spectrometry is capable of the quantitative determination of impurities in and on solid surfaces in concentrations of fractional atomic monolayers. This capability could not be exploited to any large extent in the past due to the lack of suitable standard reference materials. By means of quantitative ion implantation, however, such standards can now be manufactured. They are described and formulae are derived for correcting the fluorescent signal for attenuation due to depth distribution of the impurities as well as for interelement excitation in matrices of higher atomic number than the impurity.
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