Abstract
Ion-exclusion/adsorption chromatography of dimethylsulfoxide (DMSO) and its derivatives, i.e., methanesulfinic acid (MSI), methanesulfonic acid (MSA) and sulfuric acid (SA), was developed in order to clear the decomposition mechanism of DMSO on quality-test of TiO 2-photocatalyst in water. The separation was achieved by the adsorption effect for DMSO and ion-exclusion effect for MSI, MSA and SA under optimum conditions, using a weakly acidic cation-exchange resin column with 20 mM succinic acid as the eluent. In this system, DMSO and MSI with UV at 195 nm and MSA and SA with conductivity detection were consecutively determined by single injection and single separation column. This method was used to monitor the artificial decomposition of DMSO induced by a photocatalyst. The concentration of DMSO by active oxygens (e.g., OH radical) generated from surface of photocatalyst was found to be decreased through the stoichiometric reaction in the order of MSI, MSA and SA.
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