Abstract
Plasma discharges involving mixtures of chlorine and boron trichloride are widely used to etch metals in the production of very-large-scale-integrated circuits. Energetic ions play a critical role in this process, influencing the etch rates, etch profiles, and selectivity to different materials. The authors are using a gridded energy analyzer to measure positive ion energy distributions and fluxes at the grounded electrode of high-density inductively-coupled rf discharges. In this paper, they present details of ion energies and fluxes in discharges containing mixtures of chlorine and boron trichloride.
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