Abstract
The cathodic sputtering of copper mirrors in a hydrogen plasma was realized by means of alternating negative voltage. The time behavior of voltage was chosen to provide the broad ion energy spectrum, in qualitative agreement with the results of measurements of energy spectrum of the charge exchange atoms in fusion devices. The comparison of the degradation rates of mirror reflectivity due to the long-term sputtering was made in a multi-step way in the wavelength range λ=253–650 nm. After several steps of sputtering, the microtopography of the mirror surface was analyzed by means of a scanning electron microscope. It was shown that sputtering with energy-distributed ions leads to different degradation rates of mirror reflectivity compared to the case of monoenergetic ions. This difference is surmised to be linked with peculiarities of defect creation in the near surface layer under conditions of mirror bombardment with variable ion energy in the vicinity of a displacement-induced threshold energy.
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