Ion energy control at substrates during plasma etching of patterned structures

Abstract

In fluorocarbon-based plasma etching of dielectrics, deposition of fluorocarbon on the substrate contributes to a complex surface chemical structure that strongly affects etch rate and etch selectivity. Results reported herein demonstrate that the energy distribution of bombarding ions (IED) has a significant effect on this polymer layer, subsequently affecting etch rate and selectivity in submicron patterned structures. Specifically, we have narrowed the IED while keeping other process conditions unchanged by tailoring the shape of the rf voltage wave form used for substrate bias. Significant improvements in etch selectivity for organosilicate glass (OSG) over silicon carbide in a C4F8∕N2∕Ar plasma have been obtained by using a narrow IED compared to the broad IED resulting from the typical sinusoidal bias wave form. Trenches etched in OSG with the tailored bias voltage wave form show good feature profiles and high selectivity at feature bottoms. Slight differences in feature profiles between tailored and sinusoidal wave forms, as well as variations in etch selectivity with feature depth, are consistent with an enhancement in polymerization at the substrate in the case of the tailored bias voltage wave form.