Abstract
The vertical alignment (VA) of liquid crystal display (LCD) devices with upgraded performance is achieved on ion-bombarded SiN x surfaces. We used a plasma-enhanced chemical vapour deposition method to deposit SiN x thin films with high reliability. X-ray photoelectron spectroscopy revealed that change of orientation of LC molecules occurs on the SiO2 surface, which is directionally transformed by ion-bombarded SiN x thin film. The low-voltage transmittance characteristics and reduced response times indicate that the SiN x -based VA-LCDs have potential for low-power operating and high-speed LCD applications.
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