Abstract
Argon ion beam sputtering is used for production of high-quality Mo∕Si multilayer Bragg mirrors with 13.4nm center peak wavelength. The growth of the layer system was monitored in situ by real-time ellipsometry at multiple wavelengths within the visible to ultraviolet spectral region. The layer thicknesses of the individual multilayer constituents are obtained by model analysis of the ellipsometry data. Quality and performance of the soft x-ray mirrors is demonstrated by transmission electron microscopy, atomic force microscopy, glancing-angle of incidence CuKα reflectivity, and near-normal incidence soft x-ray reflectivity measurements. Thickness values obtained by transmission electron microscopy, reflectometry, and ellipsometry are critically compared.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
