Abstract
ABSTRACTWe have deposited thin films of optical materials using ion beam sputtering and ion assisted deposition techniques. It is possible to obtain good quality film material deposited on substrates at temperatures lower than normally required. Ion assisted deposition influences film stoichiometry and packing density, which in turn determine optical and mechanical properties of the film material. We discuss two general indicators which appear helpful in predicting the degree to which these occur.
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