Abstract
This article briefly reports microstructural, electrical transport, and magnetic measurements on Co/Si multilayers which are structurally modified by argon ion irradiation during growth. The periodicity and ferromagnetism of the multilayers is retained at ion energies approaching 400 eV. At and above this energy structural modification results in resputtering and thinning of the film, extensive mixing and a destruction of the periodic layered structure with the formation of nonequilibrium microstructures. The measurements show that the modified film is metallic in character, with the presence of low resistance paths and possible spin glass behavior in an amorphous matrix that surrounds a second microstructural component of mainly superparamagnetic nanoclusters.
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