Abstract
Epitaxial (n +−n) layers on semi-insulating GaAs samples were implanted with 60 keV He + ions at elevated temperatures. Samples were analysed to provide sheet resistivity, Hall mobility and carrier depth profiles using electrical measurement techniques and damage distributions using TEM and Rutherford backscattering and channeling. All of the data were correlated to identify the optimum conditions to achieve electrical isolation. Elevated temperature He + implants have been found to create uniform, single step isolation of GaAs layers. Isolation of the GaAs layers can be enhanced and stabilised further by a suitable post-implantation annealing process.
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