Abstract
Vacuum arc ion sources are widely used for modifying the properties of various surfaces using ion implantation. The use of cathodes consisting of multicomponent compounds in these sources makes it possible to obtain beams of complex compositions, which expands their technological capabilities. An ion beam generated in a vacuum arc ion source with a two-component cathode made of a copper-chromium composite is studied under the conditions of a magnetic field applied to the discharge gap. It is shown that the charge state distribution of copper and chromium ions in the beam depends on their ratio in the cathode material, and the fractions of these ions in the beam correspond to their atomic content in the cathode. It is shown that the ratio of copper and chromium ions in the plasma, and, accordingly, in the ion beam, is independent of the magnetic field and corresponds to their atomic ratio in the cathode.
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