Ion Beam Facility at the University of Chile; Applications and Basic Research

Abstract

The main characteristics of the ion beam facility based on a 3.75 MeV Van de Graaff accelerator at the University of Chile are described at this work. Current activities are mainly focused on the application of the Ion Beam Analysis techniques for environmental, archaeological, and material science analysis. For instance, Rutherford Backscattering Spectrometry (RBS) is applied to measure thin gold film thickness which are used to determine their resistivity and other electrical properties. At this laboratory the Proton Induced X‐Ray Emission (PIXE) and Proton Elastic Scattering Analysis (PESA) methodologies are extensively used for trace element analysis of urban aerosols (Santiago, Ciudad de Mexico). A similar study is being carried out at the Antarctica Peninsula. Characterization studies on obsidian and vitreous dacite samples using PIXE has been also perform allowing to match some of these artifacts with geological source sites in Chile.Basic physics research is being carried out by measuring low‐energy cross section values for the reactions 63Cu(d,p)64Cu and NatZn(p,x)67Ga. Both radionuclide 64Cu and 67Ga are required for applications in medicine. Ongoing stopping power cross section measurements of proton and alphas on Pd, Cu, Bi and Mylar are briefly discussed.