Abstract
Time-of-Flight Elastic Recoil Detection Analysis (ToF-ERDA) and Time-of-Flight Medium-Energy Ion Scattering (ToF-MEIS) have been employed to investigate the potential of TiN thin films as intermediate layers on Mo back contact in CZTS(e) solar cells. TiN films of various thicknesses (20, 50 and 200 nm) were prepared with reactive DC magnetron sputtering and atomic layer deposition on Mo/SLG (soda-lime glass) substrates and annealed ex situ in either S or Se atmosphere. In situ annealing of the samples to different temperatures was also performed in the MEIS setup together with subsequent ToF-MEIS and ERDA analysis.The results of the sample and interlayer composition profiles, layer quality and thickness distributions are discussed in context with complementary experimental findings partially obtained previously by X-ray Photoelectron Spectroscopy (XPS), X-ray Diffraction (XRD), Scanning Electron Microscopy and Scanning Transmission Electron Microscopy – Electron Energy Loss Spectroscopy (STEM – EELS).
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