Ion assisted deposition with an advanced plasma source

Abstract

Abstract Thermal evaporation is commonly used for the production of optical coatings. The low packing density of thermally evaporated films implies optical constants and mechanical properties which are inferior to those of the bulk materials. For the investigations of the plasma IAD process we used a newly developed advanced plasma source (APS) with special features. The properties of dielectric layers deposited with plasma-IAD will be presented in comparison to conventional thermally evaporated films. In particular, the results of scratch resistant layers in combination with antireflection coatings on organic substrates will be shown.