Abstract
Ion-assisted deposition (IAD) has become an established method for the synthesis of thin films and the modification of their structure, composition, hardness and electrical and optical properties. A variety of techniques are used to achieve the desired ion bombardment during film growth and to produce ionized species from which the film is condensed. The optimum kinetic energy of ions or condensing ionized species is between a few electronvolts and about 1 keV. IAD techniques provide non-equilibrium growth conditions which are exploited to produce unusual materials with metastable structures or phases and possessing exceptional properties. The most common IAD techniques are reviewed, including those based on plasmas and ion beams and those based on the condensation of ionized-cluster beams and mass-separated ion beams. Recent results on the preparation and properties of metastable materials are also reviewed including diamond-like carbon, hard boron nitride, superconducting cubic MoN and higher nitrides of transition metals.
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