Abstract
An Nd:YAG pulsed laser at 1064 nm wavelength with 9 ns pulse width and a maximum pulse energy of 900 mJ is focused on different metallic targets (Al, Ti, Ni, Cu, Nb, Sn, Ta, W, Au and Pb) placed in vacuum. The interaction produces a high etching for a pulse energy higher than a threshold value typical of each metal. Near the threshold a strong neutral emission takes place; at high pulse energy a stronger ionic emission occurs. The experimental thresholds of the ion emission are very similar to the threshold of the neutral emission. The atomic neutral emission is monitored by a mass quadrupole spectrometer and by the vapor thin film deposition technique. The ionic emission is detected through ion collectors (IC) using Faraday cups and time-of-flight measurements. The energy thresholds, the emission yields, the angular distribution, the fractional ionization, the kinetics and characteristics of the plasma production and the ion charge state are presented and discussed.
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