(Invited) Switching Characteristics of GaN Power Transistors

Abstract

A shorter switching time is one of the key advantages of GaN power devices over Si IGBTs. [1] In this paper, we report on the simulation of GaN power transistor switching and investigate the effect on the switching time novel design approaches ranging from the gate edge engineering (beyond just using field plates [2] for optimizing the voltage distribution in the drain-to-gate spacing to using the quantum well channel designs [3] that lead to the electron wave function penetration into wide band gap cladding layers with the commensurate increase in the breakdown voltage while keeping the advantage of high mobility in the device channel. We also report on the effect of a low conducting passivation for smoothing or even eliminating the sharp maximum of the electric field in the vicinity of the gate and field plate edges on switching time.[4] Additional contacts in the drain-to-gate spacing for the field control and variable doping implants could also decrease the switching time. Further optimization could be achieved with the perforated channel designs [5] decreasing the parasitic series resistance and improving the heat dissipation.[1] A. Tüysüz, R. Bosshard, and J. W. Kolar, erformance Comparison of a GaN GIT and a Si IGBT for High-Speed Drive Applications, Proceedings of the International Power Electronics Conference - ECCE Asia (IPEC 2014), Hiroshima, Japan, May 18-21, 2014[2] S. Karmalkar, M. S. Shur, G. Simin and M. A. Khan, Field-Plate Engineering for Heterostructure Field Effect Transistors, IEEE Trans. ED, 52, 12, pp. 2516- 2532, December (2005)[3] M. Dyakonov and M. S. Shur, Consequences of Space Dependence of Effective Mass in Heterostructures, J. Appl. Phys. Vol. 84, No. 7, pp. 3726-3730, October 1 (1998)[4] G. Simin, M. Shur and R. Gaska, SETI-0070: Semiconductor device with low-conducting field-controlling element App. No 13/396,059, November 19, 2013 as US Patent No. 8,586,997[5] G. Simin, M. Gaevski, M. Shur, R. Gaska, Perforated Channel Field Effect Transistor, US patent 9,467,105, October 11, 2016