Abstract
Ni-YSZ cermet anodes are highly optimized to achieve good mechanical strength and electrochemical performance. However, they still suffer from sensitivity to impurities like sulfur, poor redox stability, and a tendency to form carbon fibers if the H2O:C ratio is too low or there are higher hydrocarbons in the feed to the cell. In this project we utilize atomic layer deposition (ALD) to grow thin oxide films onto the anode surface to enhance both the thermal stability and coking tolerance of the Ni-YSZ cermet. We have developed an ALD system that enables controlled, sub-monolayer conformal coating of mixed metal oxide films. The growth process, coverage, composition and operational stability of these films is carefully analyzed utilizing a unique High-Sensitivity Low Energy Ion Scattering (HS-LEIS) instrument that provides the composition of the outermost atomic surface layer of the material. This ex-situ characterization is closely correlated to the electrochemical performance of the anodes.
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