Abstract

Thin-film solid oxide cells (TF-SOCs) fabricated by sputtering have been developed for power generation and hydrogen production applications. TF-SOCs have been considered for cell configuration in this development because of the potential for efficient operation at reduced temperatures (≤700oC). Reduced temperature operation allows a wider choice of cell and ancillary materials, minimizes elemental migration/interaction, and reduces thermal stresses, thus improving cell reliability and durability. Sputtering has been considered for fabrication of TF-SOCs because the technique can create dense or porous films as required for the cell components. In addition, a fabrication process based on sputtering is readily scaled to large cell sizes and large volume production. All-sputtered TF-SOC cells have been shown to exhibit exceptionally high performance in both power generation and electrolysis modes, for example, a peak power density of 2.7W/cm2 (fuel cell mode) and a current density of 2.6A/cm2 at 1.3V (electrolysis mode) at 650oC with 50%H2-50%H2O. TF-SOC cells as large as 15 cm x 15 cm size have been fabricated by sputtering. This paper discusses the development of the sputtering process for making TF-SOCs and evaluation of cell performance characteristics in power generation and hydrogen production operating modes.

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