(Invited) Designer 2D Materials and Machine-Learning Assisted Characterization

Abstract

2D materials offer enormous opportunities to build designer structures with widely tunable properties. The precise atomic engineering and quick characterization approach are critical to advance the application of designer 2D materials. This talk will introduce new optical features of designer 2D materials [1-4] with a focus on atomic substitution in monolayer WS2 [1]. The engineering of 2D materials presents unique opportunities for optoelectronic device and quantum information platform. When designing optoelectronic devices of 2D materials, spectroscopic permittivity of 2D material is a key parameter. While ellipsometry has been used to measure permittivity, it requires simple device structure, non-trivial parameter fitting, and special setup. This talk will also present a new machine-learning assisted approach to measure permittivity of 2D materials embedded in complex device structures without model fitting, which can facilitate a quick, accurate, and in-situ characterization of 2D and other thin film materials [5].