Abstract
High refractive TiO 2 films deposited by reactive electron beam evaporation, reactive ion plating and dip coating have been characterized by optical spectroscopy, electron spectroscopy for chemical analysis, Rutherford backscattering spectroscopy, nuclear reaction analysis and Raman spectroscopy. The spectral refractive index n exhibits a strong dependence on the deposition conditions. These findings will be connected to variations in density, stoichiometry, hydrogen content (H 2O) and binding structure of the layers. A strong correlation is found between optical quantities and microscopic properties of TiO 2 films.
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