Abstract

In order to better understand the formation of an “interphase”, which is a known feature between SiO 2 coatings deposited by plasma enhanced chemical vapor deposition (PECVD) and polymeric substrates, we have deposited such layers on Kapton® polyimide (PI). Various deposition routes have been used, namely thermal evaporation (physical vapor deposition, PVD), and distributed electron cyclotron resonance (DECR) PECVD, with the substrate placed within the active glow zone and downstream from it. The actual presence and the width of the interphase were investigated using glancing angle Rutherford backscattering spectroscopy (RBS), with a scattering angle of 92°. To maximize the depth resolution, the RBS experiments have been performed using “heavy” (Li + and Be +) ions.

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