Abstract
Low-pressure chemical vapour deposition (LPCVD) amorphous silicon oxynitride (a-SiOxNy) thin films of various compositions as well as the atmospheric pressure chemical vapour deposition (APCVD) borophosphosilicate glass (BPSG) thin films with varying phosphorus and boron contents were investigated. The dependence of the optical properties of the films on the deposition temperature and the gas flow ratio was studied by spectroellipsometry (SE) and infrared spectroscopy (IR).
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