Abstract
In this paper, the V2O5/Ge8Sb92 multilayer thin films were prepared and investigated. Compared with Ge8Sb92, V2O5/Ge8Sb92 film had a higher crystallization temperature and a larger conductivity activation energy. The surface roughness for V2O5/Ge8Sb92 film was small before and after crystallization. The crystallization of V2O5/Ge8Sb92 was inhibited and the grain size was only 5.0 nm. A higher stability and smaller grain made V2O5/Ge8Sb92 multilayer film a potential application in high-density phase change memory.
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