Abstract
The results of studies of carbon films in the process of their growth and etching in plasma of radio-frequency discharge in real time by in-situ X-ray reflectometry are presented. The film thickness, growth rate, density and surface roughness were calculated from the time dependence of the reflection coefficient of x-rays at a wavelength of 1.54 A. A method for the production of carbon films with a super-smooth surface was proposed.
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