Abstract
In the present work, we report the ferromagnetic (Fe, Ni) co-doped Zn1-x-yNiyFexO (y = 0.01 and x = 0.01, 0.03, 0.05) thin films fabricated through the RF magnetron sputtering on Silicon (400) substrate. Structural studies of prepared thin films through X-ray Diffraction (XRD) reveal the formation of a single-phased hexagonal structure of films. Atomic Force Microscopy (AFM) confirms the decrease in surface roughness with the increase in Fe doping. The optical band gap of the thin films analyzed through the UV–Vis spectroscopy suggests the appropriateness of prepared thin films to be utilized in optoelectronic devices. The magnetic study of these thin films confirmed the room temperature ferromagnetic (RTFM) behavior for prepared thin films. The observed magnetic behavior has been described in view of polaron percolation theory.
Highlights
Dilute Magnetic Semiconductor (DMS) in a nanometer size have been widely studied in the past few years, there has been particular interest in correlating their optical, magnetic and structural properties with the size and shape of the nanostructures [1, 2]
We have studied the room temperature ferromagnetism (RTFM) of Fe, Ni co-doped ZnO thin films by RF Magnetron sputtering, which have not reported until now
X-RAY DIFFRACTION The X-Ray diffraction arrays of the Ni, Fe co-doped DMS thin films deposited on the Si (400) substrate having the various microscopic element of “dopant” ion Zn1-x-yNiyFexO (y=0.01, x=0.01, 0.03 & 0.05) and denoted as NZF1, NZF3, NZF5 respectively [18]
Summary
Dilute Magnetic Semiconductor (DMS) in a nanometer size have been widely studied in the past few years, there has been particular interest in correlating their optical, magnetic and structural properties with the size and shape of the nanostructures [1, 2]. We have studied the ferromagnetic nature of the (Fe, Ni) co-doped Zn1-x-y NiyFexO (y = 0.01 and x = 0.01, 0.03, 0.05) thin films fabricated through the RF magnetron sputtering on Silicon (400) substrate. Structural information of the deposited transition metal-doped ZnO thin films was studied through X-ray Diffraction (XRD) techniques.
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