Abstract
The enhancement of the reflectivity of multilayer X-ray mirrors by ultrathin diamond-like carbon film deposition is investigated. The diamond-like carbon films are deposited by RF-plasma-enhanced chemical vapor deposition at room temperature. Plasma etching of DLC films is performed by RF-reactive ion etching in oxygen. It is shown that the main contribution to the decrease in reflectivity comes from the roughness of the top layer of the multilayer structure. A method of planarization of X-ray mirror surface resulting in the X-ray mirror reflectivity increase is suggested.
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