Abstract

The mass and energy spectra of the positive and negative ions at a substrate were measured in a pulsed magnetron (20–100 kHz) operated in argon, argon/oxygen and argon/helium mixtures. For a better understanding of the origin of high-energy ions and plasma dynamics of the pulsed dc magnetron discharge, time-resolved energy spectra were measured using gating of the ion beam in front of the orifice of the mass spectrometer. It was shown that the plasma potential is changing throughout the discharge volume on a time-scale of the electron plasma frequency. The mass spectroscopic results show that a significant fraction of the ions (both gas and sputtered–ionized atoms) have energies >150 eV and are generated at the beginning of the off phase in a duration of <1 μs. In reactive sputtering, the detailed study of the energy distribution of O − and O 2 − negative ions demonstrated that the surface oxygen concentration is decreasing during the “on” period in the metal mode while it is constant in the oxide mode and there is about 25 V drop of the voltage on the oxide layer in the oxide mode.

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.