Investigation of the properties of different surfaces used in evaporation systems

Abstract

This paper presents a study of the properties of surfaces with nanocoatingsof two types:NOA 81 photoresist with silanizationand NOA 65 photoresist. These surfaces are resistant to thermal and mechanical loads. The structure of the surfaces was investigated by scanning electron microscopy. The contact angle hysteresis for these surfaces wasdeterminedby the standard DSA-100 KRUSSprocedure, in which theadvancing and receding contact angles are measured, and also by a second method - measuring the contact angle under isothermal droplet evaporation. The contact angle hysteresis values measured by the two different methods are in satisfactory agreement. The contact angle hysteresis was about 20° for the NOA 81 substrateand about 50° for NOA 65.