Abstract
A laser multiparametric method based on the analysis of the parameters of the deposition zones is presented. The formation of deposition zones on the optical elements of the test-cuvette with the sample occurs during the interaction of volatile substances with laser radiation. Volatile substances are released from materials, elements and assemblies used in sealed volume under the influence of temperature. When the test-cuvette with the sample is heated up to 100 °C, the process of formation of deposition zones is accelerated. In current study, a solid-state YAG:Nd laser with a pulse repetition rate of 10 Hz, a pulse duration of 11–14 ns, a radiation wavelength of 1.064 µm, and a pulse energy of 100 mJ was used. The optical, geometric, and color parameters of the deposition zones and their resistance to the action of solvents have been studied. Silicone, activated carbon, and pressed anti-Stokes phosphor were used as samples. It is demonstrated that thin films with specified parameters can be created on the surfaces of optical elements using the laser multiparametric method.
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