Abstract
This study dealt with the deposition of nanotitanium films with different thicknesses by using the ultrahigh vacuum ion beam sputtering system. It is found that the thickness of the titanium films was in the nanoscale thus the electric resistivity of the titanium films decreased. Moreover, the deposited titanium was transformed into titanium oxide in an oxygen atmosphere and by using a rapid annealing process. The photoelectronic properties of the nanotitanium thin film was enhanced, when the nanotitanium film was transformed to titanium dioxide.
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