Investigation of the Influence of the Purity of the Silicon Surface on its Wettability

Abstract

Silicon is the basic material of microelectronics. It is made of rectifier, pulsed, microwave diodes, low frequency and high frequency, powerful and low-power bipolar transistors, field-effect transistors, charge-coupled devices. Silicon manufacturing the majority of diodes and thyristors. Silicon is widely used for the production of photosensitive devices: photodiodes and phototransistors. In addition, the silicon used to manufacture solar panels. Therefore, the study of the properties of silicon is relevant. In this study we investigated the influence of small doses of sodium chloride in water at an angle of draining the water droplets from the surface of the silicon. Surface wettability was determined by the following method. The sample was applied a drop of water of constant volume and inclination of the sample was recorded, the angle θ at which the drop began to drain from the surface found that small doses of NaCl in water does not affect the angle of motion of the drops.